Surface properties are among the most important properties that can affect the electrochemical behavior of materials. In this study, the contradictions in the results of the published researches that related to effect of deposition time were reviewed. The major area of interest discussed is the effect of deposition time on electrochemical properties of metal surfaces. The other parameters of plasma film deposition process were also highlighted in this study. The study concluded that the deposition time is important factor to improve the electrochemical properties of the deposited films. The other parameters of plasma film deposition process must be controlled to achieve the desired optimal time. Key words: Plasma; Chemical Vapor Deposition; Electrochemical Properties; Deposition Time.